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検索キーワード:(件名: #Thin films)
該当件数:20件
Principles of plasma discharges and materials processing / Michael A. Lieberman, Allan J. Lichtenberg
2nd ed. - Hoboken, N.J. : Wiley-Interscience , c2005
図書
Materials and processes for surface and interface engineering / edited by Yves Pauleau
Dordrecht : Boston : Kluwer Academic Publishers , c1995. - (NATO ASI series ; ser. E . Applied sciences ; no. 290)
Thin films for optical coatings / edited by Rolf E. Hummel and Karl H. Guenther
Boca Raton, FL : CRC Press , c1995. - (Handbook of optical properties ; v. 1)
New York : Wiley , c1994
Photochemical vapor deposition / J.G. Eden
New York : Wiley , c1992. - (Chemical analysis ; v. 122)
The materials science of thin films / Milton Ohring
Boston : Tokyo : Academic Press , c1992
Physics of polymer surfaces and interfaces / editor, Isaac C. Sanchez
Stoneham, Mass. : Butterworth-Heinemann Manning , c1992
An introduction to ultrathin organic films : from Langmuir-Blodgett to self-assembly / Abraham Ulman
Boston ; Tokyo : Academic Press , c1991
Thin films : stresses and mechanical properties : symposium held November 28-30, 1988, Boston, Massachusetts, U.S.A. / editors, John C. Bravman ... [et al.]
Pittsburgh, Pa. : Materials Research Society , c1989. - (Materials Research Society symposium proceedings ; v. 130)
Photoacoustic, photothermal, and photochemical processes : at surfaces and in thin films / edited by P. Hess : with contributions by A.C. Boccara ... [et al.]
: gw,: us. - Berlin : Tokyo : Springer-Verlag , c1989. - (Topics in current physics ; 47)
Thin film processing and characterization of high-temperature superconductors, Anaheim, CA, 1987 / editors, James M.E. Harper, Richard J. Colton, Leonard C. Feldman
New York : American Institute of Physics , 1988. - (AIP conference proceedings ; no. 165 . American Vacuum Society series ; 3)
Analytical techniques for thin films / edited by K.N. Tu and R. Rosenberg
Boston : Academic Press , c1988. - (Treatise on materials science and technology ; v. 27)
Disorder and order in the solid state : concepts and devices / edited by Roger W. Pryor, Brian B. Schwartz, and Stanford R. Ovshinsky
New York : Plenum Press , c1988. - (Institute for amorphous studies series)
The optical constants of bulk materials and films / L. Ward
Bristol, England : Philadelphia : A. Hilger , c1988. - (The Adam Hilger series on optics and optoelectronics)
Sol-Gel technology for thin films, fibers, preforms, electronics, and specialty shapes / edited by Lisa C. Klein
Park Ridge, N.J. : Noyes Publications , c1988. - (Materials science and process technology series)
Interfaces, superlattices, and thin films : symposium held December 1-6, 1986, Boston, Massachusetts, U.S.A. / editors, John D. Dow, Ivan K. Schuller
Pittsburgh, Pa. : Materials Research Society , c1987. - (Materials Research Society symposia proceedings ; v. 77)
Thin film and depth profile analysis / edited by H. Oechsner : with contributions by H.-W. Etzkorn ... [et al.]
: U.S.,: Germany. - Berlin : New York ; Tokyo : Springer-Verlag , 1984. - (Topics in current physics ; 37)
Thin film processes / edited by John L. Vossen, Werner Kern
[v. 1],v. 2. - New York : Academic Press , c1978-c1
Thin films by chemical vapour deposition / C.E. Moroșanu
: us,: ne. - Amsterdam : Tokyo : Elsevier. - Bucharest, Romania : Tokyo : Elsevier. - (Thin films science and technology ; 7)
Physics of thin films / by Ludmila Eckertová
2nd rev. ed. - New York : Plenum Press. - Prague : Plenum Press