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RT Book, Whole SR Print DC OPAC T1 Principles of plasma discharges and materials processing / Michael A. Lieberman, Allan J. Lichtenberg A1 Lieberman, M. A. (Michael A.) A1 Lichtenberg, Allan J YR 1994 FD c1994 SP xxvi, 572 p. K1 Plasma dynamics K1 Thin films -- Surfaces K1 Plasma etching K1 Plasma chemistry PB Wiley PP New York SN 0471005770 LA English (英語) CL NDC8:427.6 CL LCC:QC718.5.D9 CL DC20:530.4/4 NO Includes bibliographical references (p. 559-564) and index NO "A Wiley-Interscience publication." NO 書誌ID=B000062430; NCID=BA2405445X; LK [OPAC]https://lib.pu-toyama.ac.jp/opac/opac_link/bibid/B000062430 OL 30