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RT Book, Whole SR Print DC OPAC T1 The physics and chemistry of SiO[2] and the Si-SiO[2] interface 2 / edited by C. Robert Helms and Bruce E. Deal A1 Helms, C. Robert A1 Deal, Bruce E. A1 Electrochemical Society. Electronics Division A1 Electrochemical Society. Dielectric Science and Technology Division A1 Symposium on the Physics and Chemistry of the SiO[2] and Si-SiO[2] Interface (2nd : 1992 : St. Louis, Mo.) YR 1993 FD c1993 SP xvi , 503p. K1 Silica -- Surfaces -- Congresses K1 Dielectrics -- Surfaces -- Congresses K1 Silicon dioxide films -- Congresses K1 Surface chemistry -- Congresses K1 Surfaces (Technology) -- Congresses PB Plenum Press PP New York SN 0306444194 LA English (英語) CL LCC:QC585.75.S55 CL DC20:546/.6832 NO Proceedings of the Second Symposium on the Physics and Chemistry of the SiO[2] and Si-SiO[2] Interface, held May 18-21, 1992, in St. Louis, Missouri, sponsored by the Electronics Division and the Dielectric Science and Technology Division of the Electrochemical Society NO Includes bibliographical references and index NO 書誌ID=B000056547; NCID=BA21102079; LK [OPAC]https://lib.pu-toyama.ac.jp/opac/opac_link/bibid/B000056547 OL 30