OPAC

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California / Martin Peckerar, chair/editor : sponsored and published by SPIE--the International Society for Optical Engineering
(Proceedings / SPIE -- the International Society for Optical Engineering ; v. 1465)

データ種別	図書
出版者	Bellingham, Wash. : SPIE
出版年	c1991
大きさ	x, 340 p. : ill. ; 28 cm
著者標目	Peckerar, Martin Charles, 1946- Society of Photo-optical Instrumentation Engineers

巻　次	配架場所	請求記号	登録番号	コメント	刷　年	状　態	利用注記	ISBN	予約	請求メモ
	射水-1階-洋書	549.9\|\|E45	101100576						予約		予約

一般注記	"Part of a two-conference program ... held at the SPIE Symposium on Microlithography, 3-8 March 1991"--P. viii Includes bibliographical references and index
件　名	LCSH:Lithography, Electron beam -- Congresses 全ての件名で検索 LCSH:X-ray lithography -- Congresses 全ての件名で検索 LCSH:Ion beam lithography -- Congresses 全ての件名で検索
分　類	LCC:TK7874 DC20:621.3815/2
書誌ID	B000042225
ISBN	0819405647
NCID	BA17140471