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Silicon integrated circuits / edited by Dawon Kahng
(Applied solid state science : advances in materials and device research ; Supplement, 2)

データ種別 図書
出版者 New York : Academic Press
出版年 1981-198
本文言語 英語
大きさ 3 v. : ill. ; 24 cm
著者標目 Kahng, Dawon

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pt. C 射水-1階-洋書 549.8||SI4 100797075



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内容注記 pt. A: Physics of the MOS transistor / John R. Brews
Nonvolatile memories / Yoshio Nishi and Hisakazu Iizuka
The properties of silicon-on-sapphire substrates, devices, and integrated circuits / Alfred C. Ipri
pt. B: Physics and chemistry of impurity diffusion and oxidation of silicon / Richard B. Fair
Silicon power field controlled devices and integrated circuits / B. Jayant Baliga
pt. C. Transient thermal processing of silicon / G.K. Celler and T.E. Seidel
Reactive ion-beam etching and plasma deposition techniques using electron cyclotron resonance plasmas / Seitaro Matsua
Physics of VLSI processing and process simulation / W. Fichtner
一般注記 Includes bibliographies and indexes
件 名 LCSH:Metal oxide semiconductors
LCSH:Semiconductors storage devices
LCSH:Integrated circuits
分 類 LCC:TK7871.99.M44
DC19:621.381/71
書誌ID B000049148
ISBN 0120029545
NCID BA00942956

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